{"id":73,"date":"2015-08-05T16:40:46","date_gmt":"2015-08-05T14:40:46","guid":{"rendered":"http:\/\/www.simnano.de\/?p=73"},"modified":"2015-08-05T17:44:40","modified_gmt":"2015-08-05T15:44:40","slug":"modeling-the-in-situ-repair-of-ulk-dielectrics","status":"publish","type":"post","link":"https:\/\/www.simnano.de\/?p=73","title":{"rendered":"Modeling the in situ repair of ULK dielectrics"},"content":{"rendered":"<p><a href=\"http:\/\/www.simnano.de\/wp-content\/uploads\/2015\/08\/repair.png\"><img loading=\"lazy\" decoding=\"async\" class=\"alignleft size-full wp-image-74\" src=\"http:\/\/www.simnano.de\/wp-content\/uploads\/2015\/08\/repair.png\" alt=\"repair\" width=\"138\" height=\"117\" \/><\/a>[bibshow file =js.bib]<\/p>\n<p>Ultra low-k dielectrics are one of the key components \u00a0which allow for further shrinking of the the interconnect system\u00a0used in\u00a0todays\u00a0semiconductor technology. During manufacturing steps such as trench etching the ULK material is degraded and some repair chemistry is required to restore its k-value. In<a href=\"http:\/\/scitation.aip.org\/content\/avs\/journal\/jvstb\/33\/5\/10.1116\/1.4927564\"> a recent paper which appeared in Journal of Vacuum Science and technology <\/a>\u00a0[bibcite key=forster2015theoretical] Anja now modeled elementary steps of such an in-situ repair approach by using DFT calculations.\u00a0\u00a0<!--more--><\/p>\n<p>Anjas\u00a0work shows, which fragments of the repair molecules are appropriate for the repair of various damaged states. The methodology we demonstrate in this paper\u00a0allows for a fast screening of potential repair chemicals based on simulations. Thus,\u00a0expensive and time consuming experimental studies will be replaced by simulations\u00a0in future.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>[bibshow file =js.bib] Ultra low-k dielectrics are one of the key components \u00a0which allow for further shrinking of the the interconnect system\u00a0used in\u00a0todays\u00a0semiconductor technology. During manufacturing steps such as trench etching the ULK material is degraded and some repair chemistry &hellip; <a href=\"https:\/\/www.simnano.de\/?p=73\">Continue reading <span class=\"meta-nav\">&rarr;<\/span><\/a><\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[20,3],"tags":[13,17,18],"_links":{"self":[{"href":"https:\/\/www.simnano.de\/index.php?rest_route=\/wp\/v2\/posts\/73"}],"collection":[{"href":"https:\/\/www.simnano.de\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.simnano.de\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.simnano.de\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.simnano.de\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=73"}],"version-history":[{"count":4,"href":"https:\/\/www.simnano.de\/index.php?rest_route=\/wp\/v2\/posts\/73\/revisions"}],"predecessor-version":[{"id":78,"href":"https:\/\/www.simnano.de\/index.php?rest_route=\/wp\/v2\/posts\/73\/revisions\/78"}],"wp:attachment":[{"href":"https:\/\/www.simnano.de\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=73"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.simnano.de\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=73"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.simnano.de\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=73"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}